An Arrangement of Micrometer-scale Particles on Substrate by Electrified Dots Drawn with a Focused Ion Beam.
نویسندگان
چکیده
منابع مشابه
Nanoscale ripples on polymers created by a focused ion beam.
We show that focused ion beam irradiation results in the creation of peculiar one- and two-dimensional nanoscale features on the surface of polyimide-a common polymer in electronics, large scale structures, and the automobile industry, as well as in biomedical applications. The role of ion beam incident angle, acceleration voltage, and fluence on the morphology of the structural features is sys...
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Focused ion beam (FIB) milling can be used as a tool to fabricate structures with sub-micrometer details. The slab material can be silicon, for example, which can then be used as a mould for nano-imprint lithography, or in silicon on insulator (SOI) layer configuration suitable for photonic applications. In the latter, additional effort has to be taken to prevent high FIB induced losses, due to...
متن کاملNanometer scale patterning using focused ion beam milling
Publisher's copyright statement: Copyright (2005) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (Petit, D. and Faulkner, C. C. and Johnstone, S. and Wood, D. and Cowburn, R. P. (2005) Nanometer scale patterning using focused ion be...
متن کاملWrinkled hard skins on polymers created by focused ion beam.
A stiff skin forms on surface areas of a flat polydimethylsiloxane (PDMS) upon exposure to focused ion beam (FIB) leading to ordered surface wrinkles. By controlling the FIB fluence and area of exposure of the PDMS, one can create a variety of patterns in the wavelengths in the micrometer to submicrometer range, from simple one-dimensional wrinkles to peculiar and complex hierarchical nested wr...
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ژورنال
عنوان ژورنال: Journal of the Society of Powder Technology, Japan
سال: 1998
ISSN: 0386-6157,1883-7239
DOI: 10.4164/sptj.35.560